| 摘要 |
<P>PROBLEM TO BE SOLVED: To arrange fine particles on a substrate with high productivity. <P>SOLUTION: This arranging method comprises forming high dielectric constant area and a low dielectric constant area on the substrate with the use of a thin-film patterning method. Then the charged particles are irradiated on the surface of the substrate to accumulate the charges selectively on the high dielectric constant area. The fine particles of which the surface is electrically charged onto the substrate are supplied. They are adhered and settled selectively on the high dielectric constant area in which the charges is accumulated. <P>COPYRIGHT: (C)2003,JPO |
