发明名称 Quantum semiconductor device including quantum dots and a fabrication process thereof
摘要 A quantum semiconductor device includes intermediate layers of a first semiconductor crystal having a first lattice constant and stacked repeatedly, and a plurality of quantum dots of a second semiconductor crystal having a second lattice constant different from the first lattice constant. The quantum dots are dispersed in each of the intermediate layers and form a strained heteroepitaxial system with respect to the corresponding intermediate layer. Each of the quantum dots has a height substantially identical with a thickness of the corresponding intermediate layer.
申请公布号 US6573527(B1) 申请公布日期 2003.06.03
申请号 US19960753598 申请日期 1996.11.27
申请人 FUJITSU LIMITED 发明人 SUGIYAMA YOSHIHIRO;NAKATA YOSHIAKI
分类号 H01L29/68;H01L29/06;H01L29/12;H01L29/66;H01L29/737;H01L29/88;H01L33/06;H01L33/10;H01L33/16;H01L33/30;H01S5/00;H01S5/183;H01S5/323;H01S5/34;(IPC1-7):H01L29/06 主分类号 H01L29/68
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