发明名称 COLOR FILTER SUBSTRATE, METHOD FOR MANUFACTURING COLOR FILTER SUBSTRATE, OPTOELECTRONIC DEVICE, METHOD FOR MANUFACTURING OPTOELECTRONIC DEVICE, AND ELECTRONIC APPLIANCE
摘要 PROBLEM TO BE SOLVED: To provide a structure with which a production cost is reduced while suppressing reflection on a reflective light shielding layer in the case the reflective light shielding layer is formed in an optoelectronic device. SOLUTION: Pixel regions Pr, Pg, Pb are set in a color filter substrate 210 and light shielding regions BR are respectively set between the pixel regions. In the pixel region Pr, a coloring layer 213r exhibiting an R (red) hue is disposed on a substrate 211, in the pixel region Pg, a coloring layer 213g exhibiting a G (green) hue is disposed on the substrate 211 and in the pixel region Pb, a coloring layer 213b exhibiting a B (blue) hue is disposed on the substrate 211. Also in the light shielding regions BR a reflective light shielding layer 212B is disposed on the substrate 211 and further the coloring layers 213r, 213g and 213b are disposed and laminated thereon.
申请公布号 JP2003139932(A) 申请公布日期 2003.05.14
申请号 JP20010334608 申请日期 2001.10.31
申请人 SEIKO EPSON CORP 发明人 TAKIZAWA KEIJI
分类号 G02B5/00;G02B5/08;G02B5/20;G02F1/1335;G09F9/00;G09F9/30;G09F9/35 主分类号 G02B5/00
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