发明名称 Fabric structure for making bags and the like
摘要 <p>A fabric structure 1 comprises a nylon or polyester fabric base sheet 10, a viscidity layer 20, a polymeric back layer 30 and a protective layer 40. Layers 20 and 30 comprise a styrene based block copolymer blended with other additives, eg. viscosity modifiers, processing oils and methyl ethyl ketone. Layer 40 comprises a polyurethane resin or a modified styrenic block copolymer. The composite structure is assembled either by sequential extrusion and curing of layers 20 and 30, on base sheet 10, or by co-extrusion of layers 20 and 30 and subsequent lamination to base sheet 10 through a roller nip. In either case protective layer 40 is coated onto the resultant structure, in the final stage of the process. In use the fabric structure is used to make sports bags and similar articles, the fabric base being disposed outside the bag and the protective layer being disposed inside the bag. The fabric is stated to overcome pollution drawbacks of similar prior art fabrics employing polyvinylchloride.</p>
申请公布号 GB2381772(A) 申请公布日期 2003.05.14
申请号 GB20010026830 申请日期 2001.11.08
申请人 * EPITECH INC 发明人 CHUN-WEI * LIN
分类号 A45C3/00;B32B5/24;B32B7/12;B32B25/04;C09D175/04;(IPC1-7):B32B27/12 主分类号 A45C3/00
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