| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a film deposition apparatus which can simultaneously and uniformly perform the plasma treatment to a plurality of three-dimensional vessels by using one power supply source. SOLUTION: In the film deposition apparatus to deposit a thin film on a surface of a three-dimensional vessel by a CVD method, a film deposition chamber comprises an external electrode body formed of a conductive material with a plurality of vessel-shaped spaces for storage provided therein, an external electrode plate formed of a conductive material which is installed on an upper part of the external electrode body, a bottom lid having an exhaust port which is installed on a lower part of the external electrode body, and a vessel holding component disposed on the bottom lid, and an internal electrode is inserted in each vessel held by the vessel holding component through the bottom lid.</p> |
