发明名称 |
SEMICONDUCTOR CLEANING AGENT |
摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor cleaning agent for removing a residual generating in etching, etc., in a process for manufacturing an element using a ferroelectric material. SOLUTION: This semiconductor cleaning agent is composed of a water solution containing policarboxylic acid which is used for removing the residual which generates in the process for manufacturing the element using the ferroelectric material.
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申请公布号 |
JP2003100715(A) |
申请公布日期 |
2003.04.04 |
申请号 |
JP20010287340 |
申请日期 |
2001.09.20 |
申请人 |
MITSUBISHI GAS CHEM CO INC |
发明人 |
NANBA SATORU;ABE HISAOKI |
分类号 |
H01L21/302;H01L21/304;H01L21/3065;(IPC1-7):H01L21/306 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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