发明名称 |
POWER SEMICONDUCTOR DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a power MOS-FET whose ON-resistance is lowered in a superjunction structure and whose built-in diode has inverse recovery characteristics in a soft recovery waveform. SOLUTION: This power MOS-FET has an n-type drift layer 2 inserted on the drain side of its vertical superjunction structure comprising an n-type layer 3 and a p-type resurf layer 4. When a high voltage is applied to the MOS-FET, the n-type layer 3 and the p-type resurf layer 4 are completely depleted, and the impurity concentration of the n-type drift layer 2 is lower than the impurity concentration of the n-type layer 3.
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申请公布号 |
JP2003101022(A) |
申请公布日期 |
2003.04.04 |
申请号 |
JP20010298311 |
申请日期 |
2001.09.27 |
申请人 |
TOSHIBA CORP |
发明人 |
SAITO WATARU;OMURA ICHIRO;YAMAGUCHI SHOICHI;AIDA SATOSHI;ONO SHOTARO |
分类号 |
H01L29/78;H01L29/06;H01L29/12;(IPC1-7):H01L29/78 |
主分类号 |
H01L29/78 |
代理机构 |
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代理人 |
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地址 |
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