发明名称 POWER SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a power MOS-FET whose ON-resistance is lowered in a superjunction structure and whose built-in diode has inverse recovery characteristics in a soft recovery waveform. SOLUTION: This power MOS-FET has an n-type drift layer 2 inserted on the drain side of its vertical superjunction structure comprising an n-type layer 3 and a p-type resurf layer 4. When a high voltage is applied to the MOS-FET, the n-type layer 3 and the p-type resurf layer 4 are completely depleted, and the impurity concentration of the n-type drift layer 2 is lower than the impurity concentration of the n-type layer 3.
申请公布号 JP2003101022(A) 申请公布日期 2003.04.04
申请号 JP20010298311 申请日期 2001.09.27
申请人 TOSHIBA CORP 发明人 SAITO WATARU;OMURA ICHIRO;YAMAGUCHI SHOICHI;AIDA SATOSHI;ONO SHOTARO
分类号 H01L29/78;H01L29/06;H01L29/12;(IPC1-7):H01L29/78 主分类号 H01L29/78
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