发明名称 |
Method of vacuum holes formation on carrier film of chemical mechanical polishing machine |
摘要 |
A method of vacuum holes formation on carrier film of chemical mechanical polishing machine; the formed vacuum is to fit the dimension and position of vacuum hole on the wafer carrier of the chemical mechanical polishing machine. The present invention is that providing a formed plate and a mold for fixing and positioning, and then adjusting to produce the best laser parameters, thus forming vacuum hole of need of carrier film on chemical polishing machine via laser machine. |
申请公布号 |
US2003062346(A1) |
申请公布日期 |
2003.04.03 |
申请号 |
US20010964744 |
申请日期 |
2001.09.28 |
申请人 |
ASIA IC MIC-PROCESS, INC. |
发明人 |
JENG SHENG-HUN;HSU LU-LANG |
分类号 |
B23K26/38;B24B37/04;B24B41/06;(IPC1-7):B23K26/38 |
主分类号 |
B23K26/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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