发明名称 |
METHOD FOR PRODUCING POROUS SILICA FILM WITH SMOOTH SURFACE |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing a porous silica film capable of giving a porous silica film applicable to an optical functional material and an electronic functional material, having uniform pores and excellent in smoothness of the film surface. SOLUTION: In the method for producing a porous silica film, a substrate is coated in a humid atmosphere with a coating liquid obtained by partially hydrolyzing and dehydration-condensing alkoxysilanes in the presence of a surfactant.
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申请公布号 |
JP2003089514(A) |
申请公布日期 |
2003.03.28 |
申请号 |
JP20010276514 |
申请日期 |
2001.09.12 |
申请人 |
MITSUI CHEMICALS INC |
发明人 |
MURAKAMI MASAMI;TAKAMURA KAZUO;OIKE SHUNSUKE;KUBOTA TAKESHI;KURANO YOSHITO |
分类号 |
B05D7/24;C01B33/12;C09D183/02;C09D183/04;(IPC1-7):C01B33/12 |
主分类号 |
B05D7/24 |
代理机构 |
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代理人 |
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地址 |
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