发明名称 METHOD FOR PRODUCING POROUS SILICA FILM WITH SMOOTH SURFACE
摘要 PROBLEM TO BE SOLVED: To provide a method for producing a porous silica film capable of giving a porous silica film applicable to an optical functional material and an electronic functional material, having uniform pores and excellent in smoothness of the film surface. SOLUTION: In the method for producing a porous silica film, a substrate is coated in a humid atmosphere with a coating liquid obtained by partially hydrolyzing and dehydration-condensing alkoxysilanes in the presence of a surfactant.
申请公布号 JP2003089514(A) 申请公布日期 2003.03.28
申请号 JP20010276514 申请日期 2001.09.12
申请人 MITSUI CHEMICALS INC 发明人 MURAKAMI MASAMI;TAKAMURA KAZUO;OIKE SHUNSUKE;KUBOTA TAKESHI;KURANO YOSHITO
分类号 B05D7/24;C01B33/12;C09D183/02;C09D183/04;(IPC1-7):C01B33/12 主分类号 B05D7/24
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