PATTERNING METHOD, FILM FORMING METHOD, PATTERNING DEVICE, FILM FORMING DEVICE, ELECTRO-OPTIC DEVICE AND PRODUCTION METHOD THEREFOR, ELECTRONIC APPARATUS, AND ELECTRONIC DEVICE AND PRODUCTION METHOD THEREFOR

摘要

A novel patterning method improved in degree of freedom in material selection, a film forming method, a patterning device, a film forming device, an electro-optic device and a production method therefor, an electronic apparatus, an electronic device and a production method therefor. A patterning device (1) comprising a vacuum chamber (2) controllable to a high degree of vacuum, a nozzle (3) connected to a material supply source (7) and mounted to the vacuum chamber (2), for supplying materials from the material supply source (7) into the vacuum chamber (2), and a substrate stage (4) provided in the chamber (2), for holding and fixing a substrate (S), a moving mechanism (11) being provided to the nozzle (3) or the substrate stage (4) to relatively move their positions. Ideally, it is preferable to generate a free jet of material molecules to effect patterning (free jet patterning) using this free jet. Accordingly, a high-accuracy patterning is made available.