发明名称 |
Transistor arrangement used in the production of thin layer transistors comprises vertical semiconductor material inserted in microholes of a film composite made from two plastic films with an intermediate metal layer |
摘要 |
Transistor arrangement comprises vertical semiconductor material inserted in microholes (4) of a film composite made from two plastic films (1, 3) with an intermediate metal layer (2). The semiconductor material is provided with contacts (6, 7) by metallizing the upper and lower sides of the film composite. An Independent claim is also included for a process for the production of the transistor arrangement. |
申请公布号 |
DE10142913(A1) |
申请公布日期 |
2003.03.27 |
申请号 |
DE2001142913 |
申请日期 |
2001.08.27 |
申请人 |
HAHN-MEITNER-INSTITUT BERLIN GMBH |
发明人 |
KOENENKAMP, ROLF;CHEN, JIE |
分类号 |
H01L21/28;H01L21/00;H01L21/336;H01L21/338;H01L29/772;H01L29/786;H01L29/812;H01L51/30;H01L51/40;(IPC1-7):H01L29/786;H01L21/335 |
主分类号 |
H01L21/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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