| 摘要 |
The present invention relates to a laser annealing system which reduces damages and contamination to a chamber window by adding a buffer window between the chamber window and a silicon film being annealed by a laser beam. The laser annealing system includes a chamber window for passing a laser beam therethrough, a chamber wall constituting an outer frame of the chamber, wherein the chamber wall and the chamber window form a sealed inner space, a process chamber in which a laser annealing takes place by annealing the substrate with a laser, and a buffer layer formed between the chamber window and the substrate to reduce any contaminants from the annealing process from being deposited directly on the chamber window. The buffer layer may be equipped with a predetermined pattern to selectively block the laser beam in accordance with the pattern in order to selectively anneal the silicon film formed on the substrate.
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