发明名称 WET TREATMENT DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a wet treatment device which does not require a great deal of wet treatment liquid even when the wet treatment liquid spouts from a nozzle having a spout port and installed almost parallel to a substrate to be treated, which is inclined from the horizontal, against gravity. SOLUTION: This wet treatment device comprises the spout port installed almost parallel to the substrate 2 to be treated, which is inclined from the horizontal, and a nozzle case 4 for supplying the wet treatment liquid to the spout port and is equipped with a first nozzle 1 for spouting the wet treatment liquid to the substrate 2 to be treated, and partition plates 9 for partitioning the nozzle case 4 against the above inclined direction to form at least two flow passages.
申请公布号 JP2003088789(A) 申请公布日期 2003.03.25
申请号 JP20010285782 申请日期 2001.09.19
申请人 SHARP CORP 发明人 YONETANI MASATO;YAMAMOTO YUICHI
分类号 B08B3/02;B05C5/00;B08B3/12;H01L21/027;H01L21/304;(IPC1-7):B05C5/00 主分类号 B08B3/02
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