| 发明名称 |
Resist composition |
| 摘要 |
A resist composition containing a compound generating an acid by irradiation of an active ray or radiation and having a sulfonimide structure represented by formula (I) defined in the specification, which is excellent in sensitivity, resolution, pattern profile and edge roughness.
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| 申请公布号 |
US2003054287(A1) |
申请公布日期 |
2003.03.20 |
| 申请号 |
US20020120551 |
申请日期 |
2002.04.12 |
| 申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
YASUNAMI SHOICHIRO;NISHIYAMA FUMIYUKI;MOMOTA MAKOTO;KAWAMURA KOICHI |
| 分类号 |
G03F7/004;G03F7/038;G03F7/039;(IPC1-7):G03F7/004 |
主分类号 |
G03F7/004 |
| 代理机构 |
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代理人 |
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