| 摘要 |
To present a manufacturing method of a magneto-resistive effect type head capable of manufacturing a magneto-resistive effect type head with stabilized head characteristics. A magneto-resistive effect type head is manufactured in a method comprising a step of forming a magneto-resistive effect film (30) in a trapezoidal shape (30A) having a specified abutting angle theta1 by means of ion milling through a resist mask of overhang structure, a step of forming bias magnet films (31) for filling in sides of the magneto-resistive effect film (30), and a step of forming an electrode film (33) to overlap partly with the magneto-resistive effect film (30) through the resist mask. The angle of the ion milling is 5° or less to the normal of the substrate surface. The angle of ion beam sputtering when forming the electrode film (33) is 30° or less to the normal of the substrate surface. At the step of for forming the trapezoidal shape (30A), the anti-ferromagnetic layer is etched to the position of 30% or less of its depth. A TiW film of 3 nm to 5 nm in thickness is used inn the base film (32) of the bias magnet film (31).
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