发明名称 |
Method to reduce release time of micromachined devices |
摘要 |
A method for fabricating a micromachined device with a fast release step is provided. A first undoped sacrificial layer is deposited on a structural layer. A doped sacrificial layer is deposited on the first undoped sacrificial layer. A second undoped sacrificial layer is deposited on the doped sacrificial layer to produce a layered structure. An etchant is then applied to the layered structure.
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申请公布号 |
US6525352(B1) |
申请公布日期 |
2003.02.25 |
申请号 |
US20010837362 |
申请日期 |
2001.04.18 |
申请人 |
NETWORK PHOTONICS, INC. |
发明人 |
MULLER LILAC;STAPLE BEVAN |
分类号 |
B81B3/00;B81C1/00;(IPC1-7):H01L27/14 |
主分类号 |
B81B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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