POLYPARAXYLYLENE FILM, PRODUCTION METHOD THEREFOR AND SEMICONDUCTOR DEVICE,申请号JP2002007389-传众专利搜索

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发明名称	POLYPARAXYLYLENE FILM, PRODUCTION METHOD THEREFOR AND SEMICONDUCTOR DEVICE
摘要	<p>A low-permittivity and high-heat-resistance organic polymer film applicable to the insulation layer of a semiconductor device, a production method therefor, and a semiconductor device using it. A polyparaxylylene film including a porous structure, obtained by the step of sublimating the cyclic dimer of paraxylylene or its derivative, the step of pyrolyzing the obtained sublimate at 800-950°C, and the step of polymerizing the obtained pyrolysate; a production method therefor; and a semiconductor device.</p>
申请公布号	WO2003011952(P1)	申请公布日期	2003.02.13
申请号	JP2002007389	申请日期	2002.07.22
申请人		发明人
分类号		主分类号
代理机构		代理人
主权项
地址

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