发明名称 Optical system and exposure apparatus provided with the optical system
摘要 An optical system attains good optical performance without substantially receiving the effects of birefringence even when using an optical material having intrinsic birefringence. An optical system that includes at least one radiation transmissive member that transmits light having a wavelength of 200 nm or less has an optical axis that substantially coincides with a crystal axis [100] or a crystal axis optically equivalent to the crystal axis [100]. In addition, an optical system can include: a first group of radiation transmissive members that transmits light having a wavelength of 200 nm or less and having an optical axis that substantially coincides with a crystal axis [100] or a crystal axis optically equivalent to the crystal axis [100]; and a second group of radiation transmissive members that transmits light having a wavelength of 200 nm or less and having an optical axis that substantially coincides with a crystal axis [100] or a crystal axis optically equivalent to the crystal axis [100]; wherein the first group of radiation transmissive members and the second group of radiation transmissive members have a positional relationship rotated substantially 45° about the optical axis relative to each other.
申请公布号 US2003025894(A1) 申请公布日期 2003.02.06
申请号 US20020207109 申请日期 2002.07.30
申请人 NIKON CORPORATION 发明人 OWA SOICHI;SHIRAISHI NAOMASA;TANAKA ISSEY;OMURA YASUHIRO
分类号 G03F7/20;(IPC1-7):G03B27/54 主分类号 G03F7/20
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