发明名称 |
ACTIVE MATRIX SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide an active matrix substrate in which selective transfer with high accuracy of the position can be performed, and a method for manufacturing the substrate. SOLUTION: The active matrix substrate has a substrate 107, a position controlling member 108 disposed on the substrate 107 to form a specified space inside of the member having the inner side faces inclined, an active element 103 and an adhesive part 109 to adhere the active element 103 to the substrate 107 or to the position controlling member. The active element 103 is disposed to fiT the specified space and has outer side faces at least a part of which is inclined similar to the inner side face of the position controlling member 108. The wettability of the position controlling member 108 is controlled to be low with respect to the adhesive part 109.</p> |
申请公布号 |
JP2003022034(A) |
申请公布日期 |
2003.01.24 |
申请号 |
JP20010208724 |
申请日期 |
2001.07.10 |
申请人 |
TOSHIBA CORP |
发明人 |
HARA YUJIRO;AKIYAMA MASAHIKO;ONOZUKA YUTAKA;HIOKI TAKESHI;NAKAJIMA MITSUO |
分类号 |
G02F1/1333;G02F1/1368;G09F9/00;G09F9/30;H01L21/77;H01L21/84;H01L27/12;(IPC1-7):G09F9/30;G02F1/133;G02F1/136 |
主分类号 |
G02F1/1333 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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