发明名称 |
Plasma arcing sensor |
摘要 |
A plasma arcing sensor is used to increase the frequency of plasma arcing by way of neutralization of positive charges and negative charges. When the plasma arcing can be predicted, the process parameters to prevent from the plasma arcing can be carried out. The plasma arcing sensor comprises a top conductive layer formed over a substrate. A conductive layer is disposed between the top conductive layer and the wafer where the conductive layer and the top conductive layer are electrically isolated with dielectrics.
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申请公布号 |
US6500389(B1) |
申请公布日期 |
2002.12.31 |
申请号 |
US20000561117 |
申请日期 |
2000.04.28 |
申请人 |
UNITED MICROELECTRONICS CORP. |
发明人 |
CHOU HSIAO-PANG;SU KUAN-CHENG |
分类号 |
H01J37/32;(IPC1-7):G01N30/96 |
主分类号 |
H01J37/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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