发明名称 Plasma arcing sensor
摘要 A plasma arcing sensor is used to increase the frequency of plasma arcing by way of neutralization of positive charges and negative charges. When the plasma arcing can be predicted, the process parameters to prevent from the plasma arcing can be carried out. The plasma arcing sensor comprises a top conductive layer formed over a substrate. A conductive layer is disposed between the top conductive layer and the wafer where the conductive layer and the top conductive layer are electrically isolated with dielectrics.
申请公布号 US6500389(B1) 申请公布日期 2002.12.31
申请号 US20000561117 申请日期 2000.04.28
申请人 UNITED MICROELECTRONICS CORP. 发明人 CHOU HSIAO-PANG;SU KUAN-CHENG
分类号 H01J37/32;(IPC1-7):G01N30/96 主分类号 H01J37/32
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