发明名称 |
METHOD AND APPARATUS FOR INSPECTING FILM QUALITY INSPECTING METHOD AND FILM QUALITY INSPECTING APPARATUS |
摘要 |
PURPOSE: A method and apparatus for inspecting film quality are provided to quickly and simply inspect the crystalline status of a silicon substrate. CONSTITUTION: A film quality inspecting method includes steps of applying a measuring beam with a specific wavelength to an annealed silicon film formed on a substrate in a direction inclined with respect to the silicon film, measuring a reflection intensity or reflectivity of a reflection beam reflected by the silicon film as a result of the application, and inspecting a film quality of the silicon film based on the result value obtained by the measurement.
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申请公布号 |
KR20020092231(A) |
申请公布日期 |
2002.12.11 |
申请号 |
KR20020030525 |
申请日期 |
2002.05.31 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
TSUMURA AKIRA;YAMADA WATARU |
分类号 |
G02F1/13;G01N21/55;G01N21/84;G01N21/95;(IPC1-7):G02F1/13 |
主分类号 |
G02F1/13 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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