发明名称 METHOD AND APPARATUS FOR INSPECTING FILM QUALITY INSPECTING METHOD AND FILM QUALITY INSPECTING APPARATUS
摘要 PURPOSE: A method and apparatus for inspecting film quality are provided to quickly and simply inspect the crystalline status of a silicon substrate. CONSTITUTION: A film quality inspecting method includes steps of applying a measuring beam with a specific wavelength to an annealed silicon film formed on a substrate in a direction inclined with respect to the silicon film, measuring a reflection intensity or reflectivity of a reflection beam reflected by the silicon film as a result of the application, and inspecting a film quality of the silicon film based on the result value obtained by the measurement.
申请公布号 KR20020092231(A) 申请公布日期 2002.12.11
申请号 KR20020030525 申请日期 2002.05.31
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 TSUMURA AKIRA;YAMADA WATARU
分类号 G02F1/13;G01N21/55;G01N21/84;G01N21/95;(IPC1-7):G02F1/13 主分类号 G02F1/13
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