EXHAUST GAS TREATMENT SYSTEM AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a technique by which the running cost of a semiconductor device manufacturing device provided with an industrial pretreatment facility can be reduced. SOLUTION: The industrial pretreatment facility 3 which performs exhaust gas treatment is operated in accordance with the operation of a manufacturing facility 2 which treats a substrate by linking the facilities 2 and 3 to each other through an exhaust pipeline 6 and, in addition, connecting the facilities 2 and 3 to each other through a communication cable 17.