| 摘要 |
PROBLEM TO BE SOLVED: To provide a scanning electron microscope that does not need scanning stoppage, when a pre-evacuation chamber evacuated for the evacuation and the air leakage process and can steadily suppress deterioration of the throughput. SOLUTION: Two or more piezoelectric elements 4 are arranged between a base 17 and a sample chamber 1, and the sample chamber 1 is slanted, in response to the deformation of the sample chamber 1 caused by a vacuum evacuation and air leakage process, in the a pre-evacuation chamber 3. A lens- barrel 2 is slanted to the sample chamber 1 by its own weight, and the deviation of an irradiation position of the electron beam EB to the sample 7 can be suppressed. Since the scanning stoppage time caused by the evacuation and the air leakage process in the pre-evacuation chamber 3 is eliminated, throughput in the electron microscope is enhanced.
|
