| 摘要 |
PROBLEM TO BE SOLVED: To provide an aligner, having an illumination optical system capable of dealing with the refining of the line width of the image of a mask pattern, which is projected on a photosensitive substrate to expose the substrate to the image. SOLUTION: The aligner has a surface light-source forming means 6 for subjecting luminous flux from a light source 1 to a wavefront division to form a surface light-source; a condenser optical system 4 for illuminating a mask pattern M, based on the surface light-source formed by the surface light-source forming means 6; and a projecting optical system for projecting the image of the mask pattern M on a photosensitive substrate W. In the aligner, the surface light-source forming means 6 has a plurality of elementary lenses disposed in parallel with each other, and the luminous flux from the light source 1 is projected on each elementary lens from the inclining direction to the optical axis of each elementary lens, so that it is reflected by the side surface of each elementary lens.
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