| 摘要 |
PROBLEM TO BE SOLVED: To provide a washing tank for improving the degree of washing of a semiconductor wafer without reducing washing treatment capability and without damaging the wafer, and to provide washing apparatus and method therefor. SOLUTION: When a carrier is arranged in the washing tank 1, a semiconductor wafer 3 accommodated in the carrier 2 is brought into contact with an upper surface 20 at a projection 4 formed on a bottom surface 19 of the washing tank 1. At this time, since the semiconductor wafer 3 is accommodated in a guide groove 30 of the carrier 2, the wafer 3 moves along the guide groove 30. Then, the semiconductor wafer 3 is separated from a support surface 8 of the carrier 2, and is retained at a control position at the projection 4. Washing liquid 6 is supplied into a washing liquid tank section 10 from a washing liquid supply port 7 of the washing tank 1, and is jetted out into the tank from a jet hole 5. Then, the washing liquid 6 flows from the jet hole 5 upward in the tank, and overflows from an opening 50 at the upper section of the washing tank 1, thus washing the semiconductor wafer 3.
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