发明名称 DEVICE FOR ION-PLASMA APPLICATION OF FILMS IN VACUUM
摘要 FIELD: technology of coatings application in vacuum, particularly, devices of magnetron type for ion-plasma spraying; applicable in application of films to articles in electronic, instrumentation, optical and other industries, particularly, as optical coatings and sensitive layers of gas sensors. SUBSTANCE: device has working chamber accommodating anode 2, cathode 1 with target, magnetic systems 6 and 7 installed in nonworking side of target, means for target cooling and substrate holder with articles to be coated. Target is made of base 3 on which continuous layer of euthectic alloy 4 liquid at room temperature. A layer of powder mixture of oxides of sprayed material is applied to surface of euthectic layer 4. EFFECT: simplified design of device for ion-plasma application of oxide multicomponent films in vacuum with various percentage of components. 11 cl, dwg
申请公布号 RU2193074(C2) 申请公布日期 2002.11.20
申请号 RU19990117312 申请日期 1999.08.10
申请人 OMSKIJ GOSUDARSTVENNYJ TEKHNICHESKIJ UNIVERSITET;INSTITUT SENSORNOJ MIKROEHLEKTRONIKI SO RAN 发明人 KOZLOV A.G.;FLORIN V.A.
分类号 C23C14/35;C23C14/08;(IPC1-7):C23C14/35 主分类号 C23C14/35
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