Scanning exposure apparatus, scanning exposure method and mask

摘要

A scanning exposure apparatus in which a mask and a substrate are moved in a first direction while images of patterns of the mask are exposed onto the substrate includes at least a pair of projection optical systems that are spaced from each other in the first direction by a predetermined distance. The pair of projection optical systems also are displaced from each other in a second direction that is perpendicular to the first direction such that at least portions of projection areas where the images of the pattern are projected by the pair of projection optical systems onto the substrate overlap each other. The scanning exposure apparatus also includes a shifter that shifts the images of the overlapping projection areas on the substrate in the second direction. This enables the measurement of the flatness tolerance of long planar mirrors that are used in controlling the positions of the mask and the substrate to be easily made. Consequently, this reduces the cost of the exposure apparatus by reducing the number of measurement axes of the interferometers that are used with the long mirrors.