| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus which lessens the relative motion between members of lithographic tool. SOLUTION: The lithographic apparatus having a separated dual system comprises a separated base frame supported by an unseparated tool structure, wafer stage members supported by the separated base frame for providing a base for mounting a semiconductor wafer, reticle stage members supported by the separated base frame for providing a base for mounting a reticle and a separated bridge supported by the separated base frame for providing a base for mounting a projection optical apparatus.
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