发明名称 JUNCTION FIELD EFFECT TRANSISTOR AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a junction field effect transistor and its manufacturing method in which the labor of manufacturing process can be reduced. SOLUTION: The junction field effect transistor has a vertical structure and normally-off type on/off characteristics wherein a semiconductor substrate 1, a channel layer 3 and a source diffusion layer 9 are mainly composed of SiC. A gate line 7 is formed of a semiconductor material different from that of the channel layer 3 and making a PN junction with the channel layer 3 (a semiconductor material mainly composed of polysilicon) and the need for forming a gate diffusion layer by ion implantation is eliminated.
申请公布号 JP2002314096(A) 申请公布日期 2002.10.25
申请号 JP20010116876 申请日期 2001.04.16
申请人 AUTO NETWORK GIJUTSU KENKYUSHO:KK;SUMITOMO WIRING SYST LTD;SUMITOMO ELECTRIC IND LTD 发明人 HOSHINO TAKASHI;HIROTSU KENICHI;HARADA MAKOTO
分类号 H01L29/80;(IPC1-7):H01L29/80 主分类号 H01L29/80
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