发明名称 Semiconductor manufacturing facility and a semiconductor manufacturing method
摘要 A semiconductor manufacturing facility has a proper strength and an anti-vibration effect. The semiconductor facility contains processing apparatuses, installation tables and an installation floor. An apparatus having a vibration source is installed on an installation table having a rigid structure. The installation table is installed on the installation floor having a floor construction including a plurality of columns, which support a floor member extending in horizontal directions. An interval of the columns is 4 m to 12 m.
申请公布号 US2002155731(A1) 申请公布日期 2002.10.24
申请号 US20020103135 申请日期 2002.03.22
申请人 SUENAGA OSAMU;YAMAMOTO KAZUO;FUJIHARA KAORU;KOBAYASHI SADAO 发明人 SUENAGA OSAMU;YAMAMOTO KAZUO;FUJIHARA KAORU;KOBAYASHI SADAO
分类号 E04B5/43;F16F15/02;G03F7/20;H01L21/00;H01L21/027;(IPC1-7):H01L21/26 主分类号 E04B5/43
代理机构 代理人
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