PATTERN FORMING METHOD BY PHOTOLITHOGRAPHY AND PATTERN FORMING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a pattern forming method by photolithography in which a resist coating material of an unexposed part removed in a developing step is reutilized to reduce the consumption of an alkali developing solution used for washing the photoresist coating material off as well as to avoid waste of the photoresist coating material and to provide a pattern forming apparatus. SOLUTION: A resist removing step in which a resist coating material is removed with a solvent is carried out between an exposure step and an alkali developing step, the resist coating material is separated from waste liquor containing the dissolved resist coating material produced in the resist removing step and the separated resist coating material is refined and reutilized in a coating step.