| 摘要 |
PROBLEM TO BE SOLVED: To provide a chemical amplification type resist composition giving a resist pattern having excellent transparency to radiation, dry etching properties, sensitivity, resolution, flatness, heat resistance, etc. SOLUTION: The resist composition contains a fluorine-containing polymer (A) containing a polymerization unit which is based on a fluorine-containing diolefin (a) (e.g. CF2 =CFCF2 CH2 CH2 CH=CH2 ) and which yields a cyclic structure by polymerization and further containing a polymerization unit based on a monomer having a blocked acid group (e.g. CF2 =CFO(CF2 )3 COOC(CH3 )3 ), an acid generating compound (B) which generates an acid when irradiated with light and an organic solvent (C). |
