APPARATUS AND METHOD FOR CLEANING SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide an apparatus and a method for cleaning a substrate capable of improving detergency of the surface of the substrate by sufficiently removing fine particles on the surface of the substrate. SOLUTION: The method for cleaning the substrate comprises the steps of discharging the cleaning force of a liquid droplet from a cleaning nozzle 7 onto the surface of the substrate W rotated at a rotation stopping Pa of the substrate W as a center. The nozzle 7 has a gas discharge nozzle 100 for discharging air to its body 7b and a liquid discharge nozzle 200 for discharging pure water. The method further comprises the steps of setting the air discharged from a gas discharge port 101 and the pure water discharged from a liquid discharge port 201 to a range of 0 to 110 deg. of an incident angleαat its collision site G. The method also comprises the steps of mixing the air with the pure water in the air, and cleaning the surface of the substrate with a cleaning liquid of the liquid droplet formed as a spray state.