发明名称 Semiconductor device and manufacturing method of the semiconductor device
摘要 The package size of a diode is made smaller. On the element forming face of a semiconductor substrate having a p--type conductive type, after a hyper-abrupt p+n+ junction of a p+-type diffusion layer, an n+-type hyper-abrupt layer, an n--epitaxial layer, an n-type low resistance layer and an n+-type diffusion layer is formed, an anode electrode is formed on the top of the p+-type diffusion layer and a cathode electrode is formed on the top of the n+-type diffusion layer. Thereafter, electrode bumps are formed on the top of the anode electrode and the cathode electrode to thereby manufacture a small diode that can be facedown bonded onto a mounting board.
申请公布号 US2002102804(A1) 申请公布日期 2002.08.01
申请号 US20020046988 申请日期 2002.01.17
申请人 HITACHI, LTD. 发明人 NAGASE HIROYUKI;SUZUKI SHUICHI;OTOGURO MASAKI;ICHINOSE YASUHARU;MITSUYASU TERUHIRO
分类号 H01L29/872;H01L21/329;H01L21/60;H01L27/06;H01L29/41;H01L29/47;H01L29/861;H01L29/93;(IPC1-7):H01L21/822 主分类号 H01L29/872
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