| 摘要 |
A passivation layer, a color filter layer and a planner layer are formed in order on a substrate. Afterward, a plurality of photoresist layers are defined on the planner layer, wherein a plurality of photoresist layers are formed at a predetermined distance from each other. Subsequently, the planner layer is etched by means of a plurality of photoresist layers as a plurality of etched mask, so as to curve downward the surface of the planner layer. Next, forming a microlens layer on the planner layer and concave surface thereof. The microlens layer is then expose to light by using conventional lithography process to form a plurality of microlens regions. Final, a plurality of biconvex microlens that have lenticular shapes are formed by treating a plurality of microlens regions with a thermal process.
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