发明名称 |
ELECTROLYTIC PROCESSING DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To stably process an object to be processed to a constant depth of a groove even if a concentration of an electrolyte is varied at an electrolytic processing device for forming a desired groove on a surface to be processed of an object to be processed comprising a material subjected to electrolysis. SOLUTION: A size of a potential VA at a downstream end of a micro resistance R1 and a reference potential VS is compared by a comparator 202. A resistance value between drain-source of an FET 203 depending on the size and the potential VA is controlled such that it becomes a reference potential VS. Thereby, a current value of a pulse current is made stable.
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申请公布号 |
JP2002210615(A) |
申请公布日期 |
2002.07.30 |
申请号 |
JP20010011877 |
申请日期 |
2001.01.19 |
申请人 |
NIPPON DENSAN CORP |
发明人 |
ICHIYAMA YOSHIKAZU;YAMAZAKI KENICHI;MORI YOICHI |
分类号 |
B23H3/02;(IPC1-7):B23H3/02 |
主分类号 |
B23H3/02 |
代理机构 |
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代理人 |
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地址 |
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