发明名称 ELECTROLYTIC PROCESSING DEVICE
摘要 PROBLEM TO BE SOLVED: To stably process an object to be processed to a constant depth of a groove even if a concentration of an electrolyte is varied at an electrolytic processing device for forming a desired groove on a surface to be processed of an object to be processed comprising a material subjected to electrolysis. SOLUTION: A size of a potential VA at a downstream end of a micro resistance R1 and a reference potential VS is compared by a comparator 202. A resistance value between drain-source of an FET 203 depending on the size and the potential VA is controlled such that it becomes a reference potential VS. Thereby, a current value of a pulse current is made stable.
申请公布号 JP2002210615(A) 申请公布日期 2002.07.30
申请号 JP20010011877 申请日期 2001.01.19
申请人 NIPPON DENSAN CORP 发明人 ICHIYAMA YOSHIKAZU;YAMAZAKI KENICHI;MORI YOICHI
分类号 B23H3/02;(IPC1-7):B23H3/02 主分类号 B23H3/02
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