| 摘要 |
<p>PROBLEM TO BE SOLVED: To prevent deformations of the substrate, such as thermal expansion and deviation of a substrate from the holding position, at least prevent unexpectable deformations or deviations, on a lithography system which conducts pattern formation using energy beam. SOLUTION: Unexpectable deformations on the substrate or unexpectable deviations from the holding position are prevented by adopting the configuration by which the holding chuck for holding the substrate can be deformed as well.</p> |
