PHOTOMASK AND MANUFACTURING METHOD OF ELECTRONIC DEVICE USING IT

摘要

PROBLEM TO BE SOLVED: To manufacture a photomask for KrF excimer laser lithography in a short period and at low cost, and to reduce a manufacturing period and the cost of a semiconductor integrated circuit device. SOLUTION: In the photomask manufacturing process, a light shading body pattern is directly made using the photopolymer composition containing a chemical compound which absorbs the specific light.