| 发明名称 |
WINDOWLESS BELT AND METHOD FOR IMPROVED IN-SITU WAFER MONITORING |
| 摘要 |
A belt for polishing a workpiece such as a semiconductor wafer in a chemical mechanical polishing system includes an endless belt. The belt has an aperture. The aperture is unobstructed, such as using no window.
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| 申请公布号 |
US2002090819(A1) |
申请公布日期 |
2002.07.11 |
| 申请号 |
US19990386745 |
申请日期 |
1999.08.31 |
| 申请人 |
XU CANGSHAN;LOMBARDO BRIAN S.;BAJAJ RAJEEV;SURANA RAHUL K. |
发明人 |
XU CANGSHAN;LOMBARDO BRIAN S.;BAJAJ RAJEEV;SURANA RAHUL K. |
| 分类号 |
B24B21/00;B24B37/00;B24B37/04;B24B49/04;B24B49/12;B24B55/06;B24D7/12;B24D11/00;H01L21/304;(IPC1-7):H01L21/302;H01L21/461 |
主分类号 |
B24B21/00 |
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