| 发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION |
| 摘要 |
A photosensitive resin composition containing a high molecular compound having at least a) a fluoro aliphatic group, and b) a group represented by formula -L-P (wherein L represents a divalent organic group connected to the skeleton of the high molecular compound, and P represents an aromatic group having a carboxyl group at the ortho-position).
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| 申请公布号 |
US2002086233(A1) |
申请公布日期 |
2002.07.04 |
| 申请号 |
US19990287568 |
申请日期 |
1999.04.06 |
| 申请人 |
KAWAUCHI IKUO;AKIYAMA KEIJI;WATANABE NORIAKI;KAWAMURA KOICHI;FUJITA KAZUO;SERIKAWA TAKESHI;NAGASHIMA AKIRA |
发明人 |
KAWAUCHI IKUO;AKIYAMA KEIJI;WATANABE NORIAKI;KAWAMURA KOICHI;FUJITA KAZUO;SERIKAWA TAKESHI;NAGASHIMA AKIRA |
| 分类号 |
B41C1/10;B41M5/36;G03F7/004;G03F7/023;G03F7/032;G03F7/033;(IPC1-7):G03F7/038 |
主分类号 |
B41C1/10 |
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