DRESSER, ARRANGING METHOD FOR HARD GRAIN USED IN DRESSER AND MANUFACTURING METHOD FOR DRESSER

摘要

PROBLEM TO BE SOLVED: To suppress micro-scratch on surfaces of semiconductor substrates and obtain stable dresser characteristics. SOLUTION: The dresser on abrasive cloth for semiconductor substrate is composed of a supportive part 1 and a plurality of diamond grains 2 brazed onto the surface of supportive part 1. The diamond grains 2 are located at each vertex of unit lattice A consisting of squares or at each vertex of unit lattice B consisting of equilateral triangles, on the supportive part 1. A typical arranging method for diamond grains 2 is as follows. Place an array plate 5 in which regularly arrayed through holes 6 are formed, on the supportive part 1 to which an adhesive 4 is applied, then scatter the diamond grains 2 on the array plate 5. When all the through holes are filled with the diamond grains 2, remove excess diamond grains 2 and dismount the array plate 5 from the surface of supportive part 1.