发明名称 Stage apparatus, vibration control method and exposure apparatus
摘要 A vibration control method of a stage apparatus having a main stage body that is driven over a base plate, which controls vibration by providing a force to the base plate. The position of a center of gravity and a position of a major inertia axis of the stage apparatus is detected when vibration is applied to the base plate, and the force is controlled based on the detected position of the center of gravity and the major inertia axis. As a result, in this vibration control method, force is controlled based on the actual position of the center of gravity and the major inertia axis, which is determined when vibration is applied to the base plate of actual equipment or by simulation rather than based on the position of the center of gravity and the major inertia axis in a design model. Hence, residual vibration of the base plate is effectively controlled.
申请公布号 US2002080339(A1) 申请公布日期 2002.06.27
申请号 US20010023653 申请日期 2001.12.21
申请人 NIKON CORPORATION 发明人 TAKAHASHI MASATO
分类号 G03B27/58;G03F7/20;(IPC1-7):G03B27/58 主分类号 G03B27/58
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