发明名称 METHOD OF CLEANING SUBSTRATE FOR ELECTROPHOTOGRAPHIC PHOTORECEPTOR
摘要 PROBLEM TO BE SOLVED: To provide a method of manufacturing defect-free aluminum cylindrical substrates for electrophotographic photoreceptors by ameliorating the respective defects of machined and plastically worked goods at a time in the same line. SOLUTION: The substrate cleaning method capable of cleaning the substrates for the electrophotographic photoreceptors obtained by machining or plastic working in the same line consists of a contact cleaning process step of cleaning the substrates by brushes together with a cleaning liquid, a cleaning process step consisting of ultrasonic cleaning of cleaning the substrates by immersing the substrates into the aqueous cleaning liquid imparted with ultrasonic vibrations after the contact cleaning process step, a rinsing process stage of removing the aqueous detergent components sticking to the substrates by using water or pure water after the cleaning process step and a drying process step of drying the hot pure water sticking to the substrates by pulling the substrates from the inside of the hot pure water after immersing the substrates into the hot pure water and heating the substrates after the rinsing process stage as major constitution and includes 13 items as others.
申请公布号 JP2002182404(A) 申请公布日期 2002.06.26
申请号 JP20000384451 申请日期 2000.12.18
申请人 RICOH CO LTD 发明人 TAKASHITA YASUHIDE;MIYAMOTO FUMIO;MAYAHARA TATESHI;SUZUKI SAKAE
分类号 G03G5/00;B08B1/00;B08B1/04;B08B3/04;B08B3/12;(IPC1-7):G03G5/00 主分类号 G03G5/00
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