METHOD FOR STRUCTURING SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide an ion etching method which does not include the supply of a fluorinated organic compound gas. SOLUTION: The method for structuring a substrate having a construction of micrometer or nanometer region does not include the supply of a fluorinated organic compound gas. The method is performed by a reactive ion etching by using a mask, plasma and a fluorinated organic compound arranged on a substrate, and the fluorinated organic compound is provided in solid polymer form. A method for etching the coating on the substrate of the surface of the substrate is also provided.