| 发明名称 |
Photosensitive composition for sandblasting and photosensitive film using the same |
| 摘要 |
<p>A photosensitive composition for sandblasting comprising the components of: (A) a photopolymerizable urethane (meth)acrylate oligomer comprising (meth)acryloyl group; (B) an acrylic copolymer; and (C) a photopolymerization initiator, wherein the component (B) comprises, as a monomer unit, one of copolymerizable monomers comprising one of a benzene ring and a cyclohexyl group.</p> |
| 申请公布号 |
EP1205803(A1) |
申请公布日期 |
2002.05.15 |
| 申请号 |
EP20010309406 |
申请日期 |
2001.11.06 |
| 申请人 |
TOKYO OHKA KOGYO CO., LTD. |
发明人 |
KUMAZAWA, AKIRA;MIZUSAWA, RYUMA;NAKAZATO, SYUNJI;OBIYA, HIROYUKI |
| 分类号 |
G03F7/004;C08K5/00;C08L33/00;C08L75/08;G03F7/027;G03F7/033;(IPC1-7):G03F7/033 |
主分类号 |
G03F7/004 |
| 代理机构 |
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代理人 |
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