发明名称 |
PLASMA PROCESS DEVICE, ELECTRODE STRUCTURE THEREOF, AND STAGE STRUCTURE |
摘要 |
<p>An electrode structure used in a plasma processing apparatus which performs a predetermined process on an object (W) to be processed by using a plasma in a process chamber (26) in which a vacuum can be formed. An electrode unit (38) has a heater unit (44) therein. A cooling block (40) having a cooling jacket (58) is joined to the electrode unit (38) so as to cool the electrode unit. A heat resistant metal seal member (66A, 66B) seals an electrode-side heat transfer space (62, 64) formed between the electrode unit and the cooling block. Electrode-side heat transfer gas supply means (94) supplies a heat transfer gas to the electrode-side heat transfer space. Accordingly, a sealing characteristic of the electrode-side heat transfer space does not deteriorate even in a high temperature range such as a temperature higher than 200 DEG C and, for example, a range from 350 DEG C to 500 DEG C, and the heat transfer gas does not leak. <IMAGE></p> |
申请公布号 |
EP1205964(A1) |
申请公布日期 |
2002.05.15 |
申请号 |
EP20000937315 |
申请日期 |
2000.06.20 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
KOMINO, MITSUAKI;SASAKI, YASUHARU;TSUBOI, KYO;AMANO, HIDEAKI |
分类号 |
C23C16/46;H01L21/00;H01L21/205;H01L21/302;H01L21/3065;H01L21/31;H01L21/683;(IPC1-7):H01L21/205;H01L21/306;C23C16/505 |
主分类号 |
C23C16/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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