发明名称 MEMBER FOR VACUUM TREATING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a member for a vacuum treating apparatus which tends not to bring about the problem of particles due to the peeling of deposition. SOLUTION: The member for the vacuum treating apparatus comprises a base, a coating layer made of an inorganic material covering the base, an inorganic material of same as or different from the inorganic material for constituting the coating layer to be filled in pores which communicate with the surface of the coating layer or a filler containing the inorganic material and an organic material. In this member, the surface of the member for the treating device is processed, so that its surface roughness (Rmax) becomes 10 to 100μm.
申请公布号 JP2002134481(A) 申请公布日期 2002.05.10
申请号 JP20000326148 申请日期 2000.10.25
申请人 TAIHEIYO CEMENT CORP 发明人 WADA CHIHARU;OGURA TOMOYUKI
分类号 C23C14/00;C23C16/44;H01L21/203;H01L21/205;H01L21/302;H01L21/3065;(IPC1-7):H01L21/306 主分类号 C23C14/00
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