| 摘要 |
PURPOSE: To obtain a chemical amplifying resist material using an onium salt having excellent resolution and focus margin, a slight fluctuation in line width and deterioration in shape even during post exposure delay(PED) for a long period, slightly producing foreign materials after coating, developing and peeling, having an excellent pattern profile shape after development and high resolution for fine processing and useful especially for far ultraviolet lighography. CONSTITUTION: This onium salt is represented by the general formula 1 (wherein, R1 are each a 6-14C substituted/unsubstituted aryl group; R2s may be each the same or different and are each H or a 1-6C linear or branched or cyclic substituted/unsubstituted alkyl group; R0s are each hydroxy group, an alkoxy group, a halogen or nitro group; p is 1 or 2; q and r are each 0, 1 or 2; R3s are each a 1-10C linear, branched or cyclic substituted/unsubstituted alkyl group or a 6-14C substituted/unsubstituted aryl group; M is sulfur or iodine; and a is 3 when M is sulfur and a is 2 when M is iodine).
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