发明名称 METHOD FOR PRODUCING ORGANOSILICONE NANOCLUSTER AND METHOD FOR USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a producing method for an organosilicon nanocluster stable and containing smaller quantity of oxygen in less producing processes without a column separating process or a hydrofluoric acid treatment, and provide a method for the various applications, e.g. an electronic apparatus. SOLUTION: The producing method for the organosilicon nanocluster is as follows: A halogenized silane and an organic halide are reacted in the presence of alkaline metal or alkaline-earth metal, and the reaction product is reduced with metal hydride. Another producing method for an organosilicon nanocluster is as follows: A halogenized silane and an organic halide are reacted in the presence of alkaline metal or alkaline-earth metal, and then the reaction product is halogenated, alkoxylated, or hydroxylated, and thereafter reduced with metal hydride. Methods for various applications of this products are provided.
申请公布号 JP2002105207(A) 申请公布日期 2002.04.10
申请号 JP20000300656 申请日期 2000.09.29
申请人 HITACHI LTD 发明人 HOJO FUSAO;MIWA TAKAO
分类号 C01B33/02;C01B33/12;C07F7/02;C08G77/60;H01L21/208;H01L21/316;(IPC1-7):C08G77/60 主分类号 C01B33/02
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