| 发明名称 |
SPUTTERING TARGET FEW IN GENERATION OF PARTICLE |
| 摘要 |
PROBLEM TO BE SOLVED: To prevent spalling and scattering of deposits generating from the side face of a sputtering target. SOLUTION: This sputtering target few in particle generation, is characterized by connecting a metallic foil or sheet controlled in the roughness of its surface, to the side face of a sputtering target.
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| 申请公布号 |
JP2002069628(A) |
申请公布日期 |
2002.03.08 |
| 申请号 |
JP20000266654 |
申请日期 |
2000.09.04 |
| 申请人 |
NIKKO MATERIALS CO LTD |
发明人 |
OKABE GAKUO;MIYASHITA HIROHITO |
| 分类号 |
C23C14/34;H01L21/203;H01L21/285;(IPC1-7):C23C14/34 |
主分类号 |
C23C14/34 |
| 代理机构 |
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